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Edge lithography

D.J. Lipomi, R.C. Chiechi, M.D. Dickey, and G.M. Whitesides, Fabrication of conjugated pol3mier nanowires by edge lithography. Nano Lett., 8, 2100-2105 (2008). [Pg.461]

Dietrich, K., Lehr, D, Helgert, C., Tiinnermann, A., Kley, E.-B., 2012. Circular dichro-ism from chiral nanomaterial fabricated by on-edge lithography. Adv. Mater. 24 (44), OP321-OP325. [Pg.146]

An extension of phase-shifting edge lithography, called PnP, produces periodic 3D stractures in embossed films of photoresist.The procedure is conceptually similar to that described by Paul et in which embossed, thick... [Pg.224]

Florinated norbomane ester monomers, (V), prepared by Harada et aL (2) were effective in resist compositions when processed by ArF lithography with advantages that included improved resolution, transparency, minimal line edge roughness, and etch resistance. [Pg.563]

X-ray lithography also takes advantage of the increased resist sensitivity due to the thinner imaging films of multilayer systems. Thinner imaging films further improve X-ray resolution by minimizing the penumbra effect, a problem associated with an uncollimated X-ray beam. Consequently, the oblique exposure of features near pattern edges are minimized by multilevel resist processes, thereby restoring the desired profile. [Pg.372]

Geissler and colleagues81 demonstrated the formation of nano-scale gradients of MHA and ODT by edge-spreading lithography. Silica beads with a size of 1.6 pm formed a 2-D array on a gold surface. A mixture of the thiols in ethanol was inked with a PDMS stamp. The thiol molecules diffused with different speed via the silica... [Pg.71]

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