Downscaling Chemical Solution Deposition

Added Value of Ultrathin Films from Downscaled Chemical Solution Deposition... 

After having set the general framework for ultrathin film fabrication using downscaled chemical solution deposition in the previous section, hereafter we will discuss specific examples of dielectric films deposited in this manner. We will briefly mention different chemistries that have been used and several materials that are deposited using diverse substrates, thereby illustrating the versatility of this deposition route. 

In the broadest meaning, chemical solution deposition comprises a wide range of different methods, all having one thing in common the use of a liquid solution as a precursor. For the deposition of ultrathin films, many variants of such routes have been applied. Here, we distinguish routes based on a surface-limited reaction, namely, liquid ALD or surfece sol-gel, from downscaled sol-gel deposition methods through spin coating. 

Downscaling of chemical solution deposition routes to deposit films of a thickness lower than 100 nm can be achieved in two ways either by reducing the concentration of the precursor or by deposition of a smaller number of layers (Figure 24.5). The film thickness increases linearly with the number of layers, if... 

---