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Diffusion-enhanced silylating resist process

M.A. Hartney, R.R. Kunz, L.M. Eriksen, and D.C. LaTulipe, Comparison of liquid and vapor phase silylation processes for 193 nm positive tone hthography, Proc. SPIE 1925, 270 (1993). K. H. Baik, L. Van den Hove, and B. Roland, Comparative study between gas and liquid phase silylation for the diffusion enhanced silylated resist process, J. Vac. Set Technol. B 9, 3399 (1991) K. H. Baik, K. Ronse, L. Van den Hove, and B. Roland, Liquid phase silylation for the DESIRE process, Proc. SPIE 1672, 362 (1992). [Pg.393]

See other pages where Diffusion-enhanced silylating resist process is mentioned: [Pg.349]    [Pg.349]    [Pg.2121]    [Pg.192]    [Pg.294]    [Pg.20]   


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Diffusion enhancement

Diffusion process

Diffusion, resistance

Diffusion-enhanced

Process enhancement

Resist processes

Resist processing

Resistive process

Silylation processes

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