Design of resist

To achieve the best overall resist performance, the optimum PAG for a given resist system, whether ionic or nonionic, must balance the functional properties Hsted eadier in this section. The development of new photoacid generators, and the characterization of their functional properties, ate considered key to the design of resists with increased levels of performance. 

The photoresponsive properties of molecular glasses also have been applied in the design of resists for semiconductor lithography. In a resist, irradiation changes the solubility of the materials, making it more or less soluble (positive or negative resist, respectively). The search for new resist materials follows the development of lithographic techniques toward deep-UV and electron beam... 

An example of the wavelength matching technique is apparent in the work of Taylor et. al. (58,59). Taylor and coworkers at Bell Laboratories have demonstrated very high sensitivity in 2,3-dichloropropyl acrylate-based resist systems for exposure to the palladium emission line. The sensitivity of these materials is in part the result of the high absorption cross section of chlorine for the palladium radiation. With the exception of apparent sensitivity perterbations that can be explained on the basis of unique absorption characteristics, there seem not to be new principles involved in the design of resist materials for ion beam or x-ray exposure. 

Although high photosensitivity may not be a major factor in the design of resists for excimer laser lithography, matching of the spectral characteristics of the resist and the exposure source continues to be an important challenge. 

Determination of Inherent Resistance Risk Risk Evaluation and Design of Resistance Strategy Coordi- nation Between Manufac- turers Implemen- tation Communi- cation, Education Moni- toring Adaption, New Design of Strategy... 

Applications of Photoinitiators to the Design of Resists for Semiconductor Manufacturing... 

Approaches to the design of resist materials which incorporate chemical amplification have been directed toward three different areas ... 

Employing composites of organic and inorganic components represents a novel trend in the design of resists. In order to accommodate the fabrication of small features, at least one of the components needs to be structured on a nanoscale level. The bottleneck for preparing such nanocomposites lies in the tailoring of the surface and interfaces of the components, such that a homogeneous dispersion is obtained. 

Significantly, in order to improve the sensitivity and response and recovery speed of the prepared sensors, several methods are introduced to the design of resistance sensors (1) attaching nanoparticles which have catalytic function (e.g., Pd, Ag, Pt) onto the surface of nanoflbers [73, 81] and (2) choosing metal salts such as KCl, LiCl, NaCl, and MgCL as the dopant to add into the nanoflbers, especially in humidity sensors the influences of the nanoparticles or metal salts are illustrated in Fig. 11.4c, d [82, 84]. For example, Xu et al. [85] fabricated Ag nanoparticle-coated ZnO-Sn02 nanoflbers for the detection of formaldehyde. Due... 

Ito, H. and Willson, C.G., Applications of photoinitiators to the design of resists for semiconductor manufacturing, in Polymers in Electronics, Davidson, T, Ed., American Chemical Society, Washington, D.C., 1984, 11. 

---