Design examples semiconductor

Surface Anatysis. Surface analysis can be employed in many situations, but it is particularly well suited for the analysis of contamination or surface damage. In many industries, contamination at the nanometer scale can spell disaster for a process. For example, semiconductor materials have very predictable conductive behavior, which is essential for designing microelectronics that work properly. The addition of contaminants to the system will change the behavior of the materials and can cause failures, so it is essential that surface analysis be employed in the development of a product and sometimes during manufacturing stages to ensure that the materials are clean and reliable. 

Design rule (semiconductor processing) Spacing between interconnect metallization lines (Example 0.35 micron design rule). 

Figure 2.40 Schematic representation of the external reflectance cell design commonly employed in in situ IR experiments, if the working electrode is a semiconductor, then the semiconductor/ electrolyte interface can be studied under illumination with, for example, UV light by directing the beam perpendicular to the IR beam, as shown.

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