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Crystalline solid formation criteria

There are different criterion of how to classify solid-solid interfaces. One is the sharpness of the boundary. It could be abrupt on an atomic scale as, for example, in III-IV semiconductor heterostructures prepared by molecular beam epitaxy. In contrast, interdiffusion can create broad transitions. Surface reactions can lead to the formation of a thin layer of a new compound. The interfacial structure and composition will therefore depend on temperature, diffusion coefficient, miscibility, and reactivity of the components. Another criterion is the crystallinity of the interface. The interface may be crystalline-crystalline, crystalline-amorphous, or completely amorphous. Even when both solids are crystalline, the interface may be disturbed and exhibit a high density of defects. [Pg.160]


See other pages where Crystalline solid formation criteria is mentioned: [Pg.340]    [Pg.142]    [Pg.12]    [Pg.352]    [Pg.476]    [Pg.32]    [Pg.111]    [Pg.283]    [Pg.315]   
See also in sourсe #XX -- [ Pg.14 , Pg.131 ]




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