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Copper MOCVD precursor

YBa2Cu307 films are also obtained by MOCVD from a mixture of acetyl acetonates (tetramethyl heptadionate) of yttrium, barium, and copper, typically at a pressure of 5 Torr and at a deposition temperature of These precursor materials... [Pg.317]

To mitigate the problem, a diffusion barrier is incorporated between the aluminum and the silicon (see Sec. 5 below). It is also possible to replace aluminum by alloys of aluminum and copper or aluminum and silicon, which have less tendency to electromigration. These alloys are usually deposited by bias sputtering. However, they offer only a temporary solution as electromigration will still occur as greater densities of circuit elements are introduced. It was recently determined that improvements in the deposition of aluminum by MOCVD at low temperature with a dimethyl aluminum hydride precursor may reduce the problem.bl... [Pg.369]

Silver(I) /3-diketonate derivatives have received significant attention due to the ease with which they can be converted to the elemental metal by thermal decomposition techniques such as metal organic chemical vapor deposition (MOCVD).59 The larger cationic radius of silver(I) with respect to copper(I) has caused problems in achieving both good volatility and adequate stability of silver(I) complexes for the use in CVD apparatus. These problems have been overcome with the new techniques such as super critical fluid transport CVD (SFTCVD), aerosol-assisted CVD (AACVD), and spray pyrolysis, where the requirements for volatile precursors are less stringent. [Pg.952]

The intensive development of the chemistry of homo- and heterometallic alkoxides of copper started more than 10 years ago in connection with the prospects of their application in the preparation of materials and initially in high temperature superconductors. In the search for the appropriate precursors in sol-gel and MOCVD techniques, attention was focused on the alkoxides of copper (I) and the fluorinated alkoxides of copper (II) — oligomeric derivatives soluble in non-polar solvents and existing not only in condensed but also in the gas phase. The derivatives of copper (II) and aliphatic alcohols, even rather branched or functional ones (such as alkoxyalkoxides) turned out to be polymeric substances uninteresting for further application. [Pg.199]

The catalytic activity is a manifestation of the chemical lability of metal alkoxides especially their reactivity with hydroxyl-containing molecules. The volatility and solubility in common organic solvents of certain metal alkoxides has made them attractive precursors for depositing pure metal oxides by chemical vapour deposition (MOCVD) or by the sol-gel process. The requirement for heterometal oxides as useful materials in the electronics industry has stimulated research in this field in recent years and led to renewed interest in the preparation and characterization of alkoxides of some of the p-block elements which had previously been neglected. In particular, the discovery of the high Tc copper oxide-based superconducting heterometal oxides has made a tremendous impact on this field. [Pg.671]


See other pages where Copper MOCVD precursor is mentioned: [Pg.122]    [Pg.427]    [Pg.341]    [Pg.105]    [Pg.1048]    [Pg.161]    [Pg.274]    [Pg.1376]    [Pg.2639]    [Pg.2640]    [Pg.90]    [Pg.1375]    [Pg.2638]    [Pg.2639]    [Pg.347]    [Pg.408]    [Pg.259]    [Pg.12]    [Pg.13]   
See also in sourсe #XX -- [ Pg.427 ]




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