Chemical vapor deposition reactor analysis

The theoretical implications of finite-gap stagnation were first recognized by Chapman and Bauer [61] and later extended to combustion environments [214,359]. Evans and coworkers further extended the analysis to support chemical vapor deposition reactors [70, 71,118],... 

There are some good chemical-vapor-deposition reactors that deliberately starve the rotating disk. However, the similarity is broken by the recirculation, and the one-dimensional analysis techniques described herein lose their validity. If the chemical reaction on the surface is sufficiently slow, compared to mass transfer through the boundary layer, then the deposition uniformity will not be much affected by the boundary-layer similarity. In these... 

The details of the transitions and the vortex behavior depend on the actual channel dimensions and wall-temperature distributions. In general, however, for an application like a horizontal-channel chemical-vapor-deposition reactor, the system is designed to avoid these complex flows. Thus the ideal boundary-layer analysis discussed here is applicable. Nevertheless, one must exercise caution to be sure that the underlying assumptions of one s model are valid. 

P. Ho, M.E. Coltrin, and W.G. Breiland. Laser-Induced Fluorescence Measurements and Kinetic Analysis of Si Atom Formation in a Rotating Disk Chemical Vapor Deposition Reactor. J. Phys. Chem., 98(40) 10138—10147,1994. 

Chemical vapor deposition and heterogeneous catalysis share many kinetic and transport features, but CVD reactor design lags the corresponding catalytic reactor analysis both in level of sophistication and in scope. In the following we review the state of CVD reactor modelling and demonstrate how catalytic reactor design concepts may be applied to CVD processes. This is illustrated with an example where fixed bed reactor concepts are used to describe a commercial "multiple-wafers-in-tube" low pressure CVD reactor. 

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