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Chemical vapor deposition reaction pathways

A. Zinn, B. Niemer, andH.D. Kaesz, Reaction Pathways in Organometallic Chemical Vapor Deposition (OMCVD), Advanced Materials, Vol.4,1992, pp.375-378. [Pg.329]

Fundamental aspects of vapor-liquid-solid (VLS) semiconductor nanowire growth are presented here. The synthesis of VLS semiconductor has been extended to different reaction media and pathways from the early chemical vapor deposition (CVD) approach, including solution-liquid-solid (SLS) and supercritical fluid-liquid-solid (SFLS), laser-catalyzed growth, and vapor-liquid-solid-epitaxy. The properties of nanowires grown by these VLS embodiments are compared. In this entry, VLS growth of nanowire heterostructures and oriented and hyperbranched arrays is examined. In addition, surface passivation and functionalization are assessed, and the importance of these techniques in the progress toward VLS produced nanowire devices is detailed. [Pg.3191]


See other pages where Chemical vapor deposition reaction pathways is mentioned: [Pg.142]    [Pg.515]    [Pg.152]    [Pg.731]    [Pg.427]    [Pg.432]    [Pg.662]    [Pg.157]    [Pg.158]    [Pg.159]    [Pg.160]    [Pg.363]    [Pg.698]    [Pg.649]    [Pg.101]    [Pg.50]    [Pg.457]    [Pg.222]    [Pg.8]    [Pg.435]    [Pg.222]    [Pg.222]   
See also in sourсe #XX -- [ Pg.2 , Pg.2 , Pg.5 , Pg.17 ]

See also in sourсe #XX -- [ Pg.2 , Pg.2 , Pg.5 , Pg.17 , Pg.18 ]




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