Characterization of surface processes during oxide CMP by in situ FTIR spectroscopy

Characterization of surface processes during oxide CMP by in situ FTIR spectroscopy 

Oxide CMP as well as modem trends and aspects in CMP investigations are exteisively treated in comprehensive books (Steigerwald et al., 1997 Oliver, 2004 Li, 2008) and complemented by numerous reviews (Luo and Domfeld, 2001 Matijevic and Babu, 2008 Krishnan et al., 2010). As this chapter shows in the case of Fourier-transform infrared (FTIR) spectroscopy, novel in situ techniques are able to contribute to the theoretical understanding and process control of oxide CMP. 

Advances in Chemical Mechanical Planarization (CMP). http //dx .doi.oi l0.1016 978-0-08-100165-3.00014-0 Copyright 2016 Elsevier Ltd. All ri ts reswved. 

In the case of ceria as an abrasive in contact with silica as the layer to be polished, its redox-active behaviour additionally influences the RR. This effect is called the chemical tooth . 

pH value buffers, salts, surfactants, inhibitors and different other components in the slurries, 

---