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Attenuated phase-shifting mask

B.J. Lin, The attenuated phase shifting mask, Solid State Technol. 35(1), 43 47 (1992) T. Terasawa, N. Hasegawa, and H. Fukuda, Imaging characteristics of multi phase shifting and half tone phase shifdng masks, Jpn. J. Appl. Phys. 30(1 IB), 2991 2997 (1991). [Pg.621]

Furthermore, because chromium has proven difficult to dry etch, there have been considerable efforts expended in finding alternative mask opaque absorber materials. Molybdenum silicide (MoSi) appears to be gaining traction in certain applications, particularly in attenuated phase-shifting mask (att-PSM) and EUV mask applications (see Section 14.3), and even for binary masks. ... [Pg.627]

Smith BW (1996) Attenuated phase shift mask materials for 248 and 193 nm lithography. J Vac Sci Technol B 14 3719-3723... [Pg.2710]

See other pages where Attenuated phase-shifting mask is mentioned: [Pg.888]    [Pg.2702]    [Pg.888]    [Pg.2702]    [Pg.165]    [Pg.144]   
See also in sourсe #XX -- [ Pg.165 , Pg.621 , Pg.622 ]



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