Arsenic oxyfluorides

In films generated in oxygen plasma, the contribution of arsenic oxides exceeds that of indium oxides. Addition of NF3 gas to oxygen plasma results in a strong shift in synthesis towards formation of indium and arsenic fluorides. All indium in the film is combined with fluorine, and the arsenic peak is a superposition of several components -arsenic oxyfluorides. Composition of the generated film also includes nitrogen. [Pg.297]

ARSENIC (7440-38-2) Finely divided material forms explosive mixture with air. Decomposes on contact with acids or acid fumes, emitting fumes of arsenic. Contact of dust or powder with strong oxidizers can cause ignition or explosion. Violent reaction with bromine azide, bromine pentafluoride, bromine trifluoride, dichlorine oxide, hypochlorous acid, nitrogen trichloride, tribromamine hexaammoniate, nitrogen oxyfluoride, potassium chlorate, potassium dioxide, powdered rubidium, silver fluoride. Incompatible with strong acids, cesium acetylene carbide, chromic acid, chromium trioxide, hafnium, halogens, lead monoxide, mercury oxide, nitryl fluoride, platinum, potassium nitrate, silver nitrate, sodium chlorate, powdered zinc. [Pg.132]