Aluminum organic semiconductor lasers

Several techniques have been developed to deposit alumina films on different surfaces such as those of semiconductors or metals. These films find apphcation in various areas. In most cases, amorphous alumina films are desired. Depending on the deposition techniques, various precursors may be used the following combinations have been reported plasma-enhanced atomic layer deposition using trimethylaluminum (112), metal-organic chemical vapor deposition using aluminum tri-iso-propoxide (113), and condensation from the gas phase using laser-evaporated alumina (114). Similar evaporation techniques can also be apphed to prepare Y-AI2O3 powders (115,116). 

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