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Agglomeration, control using colloid

Advanced materials, chemistry, 2-5 Aerospace industry, materials used, 236 Agglomeration, control using colloid chemical principles, 89-91, 92/ Aging studies... [Pg.261]

There are six integrated steps that may be employed in the development of a particle system with tailored size and morphology. These are (i) know the material (ii) determine synthesis conditions to prepare the desired phase (iii) develop methods to control particle size within the context of the material system (iv) develop techniques to control particle morphology within the context of the material system (v) control the state of agglomeration using colloid chemical principles and (vi) control yield of the material by selection of the starting materials and their concentrations. [Pg.83]

The reduction of transition metal salts in solution is the most widely practiced method for synthesis of metal colloidal suspensions [7]. In the preparation process, polymer is often used in order to prevent the agglomeration of metal particles as well as to control their size. Ahmadi et al. [5] reported that the concentration of the capping polymer affects the shape of platinum particles obtained by salt reduction. This means that the addition of a... [Pg.301]

A major obstacle in making precise structures with metal colloids has been the control of aggregation and particle size distribution. The use of micelles has allotted some success in this regard with the formation of different metal colloid geometries [30]. It is known that the nanoparticles must be stabilized by organic molecules attached to their surface [31] and in general must be embedded in a solid matrix [32], This is done to prevent agglomeration and precipitation as... [Pg.516]

Other efforts have also been made to modify the CL microstructure by controlling the agglomerate size in the catalyst ink. Uchida et al. [145] proposed a colloidal ink fabrication procedure using low-dielectric-constant solvents to generate a good network and a uniformity of perfluorinated... [Pg.95]

Transition-metal nanopartides are of fundamental interest and technological importance because of their applications to catalysis [22,104-107]. Synthetic routes to metal nanopartides include evaporation and condensation, and chemical or electrochemical reduction of metal salts in the presence of stabilizers [104,105,108-110]. The purpose of the stabilizers, which include polymers, ligands, and surfactants, is to control particle size and prevent agglomeration. However, stabilizers also passivate cluster surfaces. For some applications, such as catalysis, it is desirable to prepare small, stable, but not-fully-passivated, particles so that substrates can access the encapsulated clusters. Another promising method for preparing clusters and colloids involves the use of templates, such as reverse micelles [111,112] and porous membranes [106,113,114]. However, even this approach results in at least partial passivation and mass transfer limitations unless the template is removed. Unfortunately, removal of the template may re-... [Pg.94]

Nucleation of particles in a very short time followed by growth without supersaturation yields monodispersed colloidal oxide particles that resist agglomeration (9,10). A large range of coUoidal powders having controlled size and morphologies have been produced using these concepts (3,14). [Pg.248]

Interlayer dielectric (ILD) CMP typically uses a fumed silica slurry dispersed in an aqueous medium at a pH near 11 Fumed silica is a widely adapted abrasive for ILD CMP because of its inexpensive price, high purity, and colloidal stability. However, fumed silica is difficult to disperse in an aqueous system, and it is difficult to control powder processing because of the large specific surface area of 90 15 mVg, making it very reactive. ILD CMP slurry was prepared at pH 11 to accelerate the chemical attack on the deposited PETEOS film on the wafer surface. But silica particles dispersed in aqueous media are partially dissolved at pH 11. Consequently the removal rate decreased and microscratches were generated on the wafer surface due to agglomeration of silica particles as surface potentials decreased. ... [Pg.183]

Polyvinyl alcohols (PVAl) are manufactured by saponification of vinyl acetate polymers (PVAc). Properties of PVC using PVAl as a protective colloid are influenced by the solution viscosity of the PVAl, i.e. the degree of polymerization of the PVAc and the degree of saponification. Polyvinyl alcohols of 75-90% hydrolysis are primary suspension agents for S-PVC, whereas polyvinyl alcohols of 25-40% hydrolysis are secondary suspension agents, which control the agglomeration of the primary particles. Partially hydrolyzed PVAc can be block or random polymers. [Pg.116]


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Agglomeration

Agglomerator

Agglomerization

Colloidal agglomeration

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