Acrylic acid alicyclic

A significant number of works are concerned with the development of new membranes for the separation of mixtures of aromatic/alicyclic hydrocarbons [10,11,77-109]. For example, the following works can be mentioned. A mixture of cellulose ester and polyphosphonate ester (50 wt%) was used for benzene/cyclohexane separation [113]. High values of the separation factor and flux were achieved (up to 2 kg/m h). In order to achieve better fluxes and separation factors the attention was shifted to the modification of polymers by grafting technique. Grafted membranes were made of polyvinylidene fluoride with 4-vinyl pyridine or acrylic acid by irradiation [83]. 2-Hydroxy-3-(diethyl-amino) propyl methacrylate-styrene copolymer membranes with cyanuric chloride were prepared, which exhibited a superior separation factor /3p= 190 for a feed aromatic component concentration of 20 wt%. Graft copolymer membranes based on 2-hydroxyethyl methylacrylate-methylacrylate with thickness 10 pm were prepared [85]. The membranes yielded a flux of 0.7 kg/m h (for feed with 50 wt% of benzene) and excellent selectivity. Benzene concentration in permeate was about 100 wt%. A membrane based on polyvinyl alcohol and polyallyl amine was prepared [87]. For a feed containing 10 wt% of benzene the blend membrane yielded a flux of 1-3 kg/m h and a separation factor of 62. 

Ionized gels were acrylic acid-sodium acrylate copolymers. The samples were provided by Norsolor Company. The gels were obtained through an inverse suspension process. In this technique, the aqueous phase, containing an hydrophilic monomer, was dispersed in an organic phase, such as an alicyclic or aliphatic hydrocarbon. 

The acrylate platform is characterized by the presence of pendant aliphatic and alicyclic units with acid labile groups on an acrylate backbone. These resist polymers have high transparency at 193 nm, excellent adhesion properties, and high... 

The backbone of the CO polymer platform is alicyclic units with pendant ester-protecting groups, acidic groups, and adhesion-promoting groups. Resist polymers of this platform generally have higher plasma etch stability, but are also more hydrophobic than their acrylate and COMA counterparts. 

---