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Vapour Deposition Systems Design

This chapter introduces new equipment design and a CVD process methodology. The chapter then gives details of the most commonly used subsystems followed by some special applications of CVD processes. [Pg.73]

1 Proactive Design Approach for Chemical Vapour Deposition Systems [Pg.73]

Final selected concept models as best solution [Pg.74]

Chapter 3 Chemical Vapour Deposition Systems Design... [Pg.73]

The reaction chamber is the heart of a CVD system where chemical vapour deposition takes place. It consists of retort, gas inlet injector, distributor and outlet exit. The quality of the deposit is mainly dependent on the design of the reaction chamber, which determines the uniformity of temperature, concentration and pressure. [Pg.78]

See other pages where Vapour Deposition Systems Design is mentioned: [Pg.110] [Pg.11] [Pg.375] [Pg.244] [Pg.42] [Pg.42] [Pg.245] [Pg.443] [Pg.219] [Pg.155] [Pg.470] [Pg.274] [Pg.345] [Pg.747] [Pg.494]

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Vapour systems