Vanadium vapor pressure, high temperature

The best results were obtained with compound 21 that exhibited high vapor pressure and low decomposition temperature (<523 K). Various CVD conditions were applied and gave in all cases shiny, dark-brown deposits.43 XRD and XPS analyses of the deposits indicated the presence of a vanadium carbonitride phase with little contamination from oxygen and free carbon. The films were less adherent on steel substrates than on silicon ones. The steel substrates seemed to suffer corrosion due to the presence of Cl-containing species. We had noticed the same feature in the case of Cl-containing precursors to vanadium carbide. Therefore, in order to increase the volatility of compound 23 and to reduce the Cl content of the molecule, we prepared compounds 24 and 25. Unfortunately, the yields obtained in their syntheses were much too low to permit TG and CVD experiments. 

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