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Valve metal systems

Michaelis reviews the application of valve metals in electronics based on the dielectric properties of ultra-thin films. Following presentation of fundamental principles and experimental details, the discussion of valve metal systems includes thin film oxide behavior of Ti, Zr, Hf, Nb, Ta, and Al. The application of these valve metal systems in electrolytic capacitor manufacturing is discussed with emphasis on current development trends and research issues. In addition, special emphasis on Si02 dielectric films is provided for integrated circuit applications associated with dynamic random access memory chip fabrication. [Pg.357]

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