UV image hardening

Figure 10. UV-image hardening of AZ2400 patterns (a) original patterns, (b) 155° C heating for 30 min, (c) 155°C heating for 30 min after 10 min of...

Fig. 12 (Right) Comparison of thermal flows of 3.5 fim thick resist images at 250°C (a) no treatment, (b) electron beam hardening, (c) Deep UV-hardening.

The capsule wa11 is transparent to UV, but provides a substantial barrier to atmospheric oxygen. The capsules are usually coated on a flexible substrate. Upon exposure, the monomer hardens to a degree dependent on the intensity of the light. When pressure is applied to the capsules, the monomer which has not been immobilized can be transferred onto a special image developing paper (Figure 2). 

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