Thin-film multilayer conductor deposition

Thin films (qv) of vitreous silica have been used extensively in semiconductor technology. These serve as insulating layers between conductor stripes and a semiconductor surface in integrated circuits, and as a surface passivation material in planar diodes, transistors, and injection lasers. They are also used for diffusion masking, as etchant surfaces, and for encapsulation and protection of completed electronic devices. Thin films serve an important function in multilayer conductor insulation technology where a variety of conducting paths are deposited in overlay patterns and insulating layers are required for separation. 

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