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Thickness, of oxide layers

Figure 6. Typical shape of normalized oxidation profiles into thick PE samples (typically few mm thick). Determination of the thickness of oxidized layer using... Figure 6. Typical shape of normalized oxidation profiles into thick PE samples (typically few mm thick). Determination of the thickness of oxidized layer using...
Figure 8. Plot in logarithmic co-ordinates of the thickness of oxidized layer for PE at room temperature in atmospheric air versus ydose rate. Points Literature experimental data. Continuous line kinetic model based on... Figure 8. Plot in logarithmic co-ordinates of the thickness of oxidized layer for PE at room temperature in atmospheric air versus ydose rate. Points Literature experimental data. Continuous line kinetic model based on...
Figure 7.18 (a) Growth of an oxide layer by the outward diffusion of metal cations and electrons. (i>) Concentration profile of defects and neutral species, (r) Schematic of quasi-steady-state approximation — concentration profile, which is proportional to the flux at any time /. is not a function of. v. Nevertheless, as the thickness of oxide layer. v increases, the flux decreases (slope decreases). In both (h) and (r) the profile is assumed to be linear for simplicity. [Pg.214]

Fig. 3.1-147 Thickness of oxide layer and crack length per area versus testing time. Mo 4N5 Mo ribbon, electropolished surface MY Mo-0.47wt%Y2O3-0.08wt%Ce203 ribbon, electropolished surface, test conditions 5(X)°C/air [1.133]... Fig. 3.1-147 Thickness of oxide layer and crack length per area versus testing time. Mo 4N5 Mo ribbon, electropolished surface MY Mo-0.47wt%Y2O3-0.08wt%Ce203 ribbon, electropolished surface, test conditions 5(X)°C/air [1.133]...
SEM observation and EDS analysis were performed on the surface to evaluate the thickness of oxide layer. Typical results of SEM image and EDS line profile are presented in Fig. 4a, b. The morphology of the surface was obviously different from that of the irmer part of the specimen. The distributions of Ba, Si, Al, and O elements... [Pg.250]

The growth rate of thermal oxidation decreases with increase in the thickness of oxide layer, because it relies on the diffusion of oxygen. The chemical vapor deposition (CVD) process can make thicker silicon dioxide layer and does not require silicon substrate. Silane is a toxic extremely flammable chemical compound with chemical formula SiH4. The silane CVD process using silane gas is based on the following reaction ... [Pg.380]


See other pages where Thickness, of oxide layers is mentioned: [Pg.8]    [Pg.702]    [Pg.156]    [Pg.368]    [Pg.204]    [Pg.207]    [Pg.210]    [Pg.140]    [Pg.253]    [Pg.255]    [Pg.222]    [Pg.702]    [Pg.417]    [Pg.123]    [Pg.130]    [Pg.142]    [Pg.451]   
See also in sourсe #XX -- [ Pg.426 ]




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Layer thickness

Oxidants layer

Oxidation oxide thickness

Oxide layer

Oxide layer thickness

Oxide thickness

Oxides layered

Thick layers

Thickness of layers

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