Thick Resist Lithography

Thick Resist Lithography, Fig. 1 Schematic of the basic lithography process. First, a resist fihn is coated onto the substrate of interest that may contain either films to he etched or films that can be used to deposit other materials by techniques such as plating. The resist fihn is exposed pattern-wise to radiation which results in a physiochemical change in the exposed resist that... 

Thick Resist Lithography, Fig. 2 Example of the structure of a novolac resin and the commercial production route for the polymer that is typically accomplished via the acid-catalyzed polymerization of cresols with formaldehyde... 

Thick Resist Lithography, Fig. 3 Schematic picture of the mechanism by which DNQ-novolac resists function. Addition of DNQ inhibitor (/) to novolac polymer (AO results in a dramatic reduction in the dissolution rate of the polymer in aqueous alkaline developer solutions. Exposure of the DNQ-novolac resist mixture causes a chemical reaction converts the diazonaphthoquinone to... 

Thick Resist Lithography, Figure 4 Exampie of the effect of x-ray irradiation on the molecular weight of an initially high molecular weight... 

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