The CVD of Aluminum Nitride

Aluminum nitride (AIN) is deposited by CVD both experimentally and on a production basis. Coatings of aluminum nitride (AIN) are produced at high-temperature by the reaction of ammonia with either the chloride or the bromide as metal sources in a hydrogen atmosphere at low pressure ( 100 Pa) [ H50] 

Reaction 2 is also used with a plasma at a deposition temperature of 200-800°C.P I 

AIN can be produced by MOC VD by reacting ammonia with trimethyl aluminum at low pressure ( 130 Pa) at 900-1400 C l l 

The pyrolysis of aluminum-nitrogen organic complexes such as diethyl aluminum azide [(C2Hj)2AIN3] is also used successfully at low deposition temperatures (450-870°C).l l Another metallo-organic, hexakis(dimethylamido)dialuminum, reacting with ammonia allows deposition at 200-250 C at atmospheric pressure.l I 

---