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Temperature extremes working environment control

Layered nanostructures can be deposited from the electrochemical environment by applying a time dependent voltage program to the working electrode (5) or by using a sequential deposition scheme such as electrochemical atomic layer epitaxy (EC-ALE) (6-10). In EC-ALE, a surface-limited electrochemical reaction, such as underpotential deposition (upd), is used to synthesize a binary compound by successive deposition of each element from its respective solution precursor. EC-ALE is an attractive electrosynthetic alternative to conventional deposition methods that is inexpensive, operates at ambient temperature and pressure and provides precise film thickness control. This technique promises to overcome many problems associated with other electrosynthetic approaches, such as the formation of highly polycrystalline deposits and interfacial interdiffusion. For example, we have recently used EC-ALE to fabricate stable semiconductor heterojunctions with extremely abrupt interfaces (11). [Pg.283]

If they can be made to work correctly in dusty or dirty environments, or at extreme temperatures, then they can be used under severe field conditions. However, most medical devices are expected to be used in clean conditions at moderate temperatures. Such conditions prevail in most modem hospitals in the developed world. In third-world countries or during combat, however, medical environments are not as well controlled. [Pg.565]


See other pages where Temperature extremes working environment control is mentioned: [Pg.528]    [Pg.104]    [Pg.104]    [Pg.194]    [Pg.179]    [Pg.439]    [Pg.299]    [Pg.220]    [Pg.41]    [Pg.57]    [Pg.57]    [Pg.203]    [Pg.439]   
See also in sourсe #XX -- [ Pg.254 ]




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