Tantalum subhalides

Electrodeposition of tantalum thin layers in the water- and air-stable ionic liquid 1-butyl-l-methyl pyrrolidinium bis (trifluoromethylsulfonyl) amide at 200 °C using TaFs as a source of tantalum is presented in this protocol. The electrodeposition of Ta is not a straightforward process as, under the wrong experimental conditions. Ta subhalides can be formed, see Chapter 4.4. 

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