Tantalum silicide TaSi

As a practical case, let us take an example of two samples of the tantalum silicide (TaSi) films containing different Ta/Si compositions on Si substrates. One of the films is 230 nm thick, while the other film is 590 nm thick. The two RBS spectra, recorded using a 2.2 MeV He ion beam, from two TaSi films of different Ta/Si compositions on Si substrates are shown in Fig. 2.21. In both spectra, the high-energy peak arises by scattering from tantalum in the TaSi film layer. The peak at lower energy is from silicon, which appears in both the... 

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