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Tantalum disilicide

Tantalum disilicide, TaSi2, is very refractory and chemically resistant. It is deposited from the reaction of the chloride, TaCl5, with silane (SiH4), or dichlorosilane (SiH2Cl2), the latter precursor being preferred. The reaction takes place in a plasma as follows ... [Pg.330]

Wieczorek, C., Chemical vapor deposition of tantalum disilicide. Thin... [Pg.117]

The silicides of major industrial importance are the disilicides of the refractory metals molybdenum, tantalum, titanium, tungsten, vanadium, and zirconium.pl] These compounds are of great interest par-... [Pg.327]

See other pages where Tantalum disilicide is mentioned: [Pg.330]    [Pg.472]    [Pg.661]    [Pg.472]    [Pg.330]    [Pg.472]    [Pg.661]    [Pg.472]    [Pg.245]    [Pg.1257]    [Pg.708]    [Pg.342]    [Pg.353]   
See also in sourсe #XX -- [ Pg.100 ]

See also in sourсe #XX -- [ Pg.661 ]



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Disilicide

Disilicides

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