Surfactant-Based Multilayer Assemblies

During the trichlorosilane assembly process ordy trace amount of moisture is tolerable, and it is known that moisture may induce horizontal polymerization of trichlorosilane surfactants (31). For the build-iq> of structurally regular multilayer assemblies, a quantitave reaction yield is a necessary requirement for each step to maintain the same surface fimctional doisity in every monolayer. Several surface functionalization procedures have been reported, but there has been limited application to multilayers (14, 24. 29). Despite these technical drawbacks, the resulting siloxane-based films are generally much more stable than those self-assenibled by non-covalent interactions such as in the Langmuir-... 

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