Surface energy isopropyl alcohol

The relation between the excitation state of the surface bonds and the activation energy, discussed so far, is easy to understand when the rate-determining step of the reaction considered involves the dissociation of the more or less excited surface bond. In order to investigate the importance of the excitation state of the surface bond in a reaction without oxygen transition, the decomposition of isopropyl alcohol vapour on a ZnO catalyst in the dark and in ultraviolet light has been studied 93-95). 

A similar etch rate dependence on concentration is found for the three major surfaces in KOH-IPA solutions as shown in Fig. 7.14, but unlike at lower temperatures, solution stirring has little effect on the etch rate. ° The activation energy of the etching process is 0.56-62 eV for KOH of different concentrations indicating that the etching is controlled by a surface process. KOH solutions are often buffered with isopropyl alcohol (IPA), which results in a decrease of etch rates. ... 

---