Sulfonyl chloride diazonaphthoquinone

DQ Disappearance. To study the effect of pyrene on DQ disappearance, n-propanol solutions in a quartz tube with I.D. of 4mm were irradiated with a 450W medium pressure Hg lamp through a 313nm interference filter. Typically, the optical densities at 313nm for DQ solutions with and without pyrene are 0.8 and 0.4 respectively. The disappearance of DQ was monitored at 405nm in a solution of sulfonyl chloride diazonaphthoquinone. 

Generally, the diazonaphthoquinone derivative consists of DQ and other aromatic portions which are connected by sulfonyl ester linkages. In order to avoid the interference of the aromatic portion on the energy transfer from pyrene to DQ in liquid solutions, a sulfonyl chloride diazonaphthoquinone was used in the study in n-propanol. In the absence of sulfonyl chloride DQ, the lifetime of pyrene in n-propano. was measure to be 280 ns. (4) In the presence of 6x10 M and 3x10 M sulfonyl... 

Fig. 11. Synthesis of DNQ photosensitizers found in commercial resists, (a) Condensation of l,2-diazonaphthoquinone-5-sulfonyl chloride with 1,2,3-trihydroxybenzophenone. Often the reaction is not carried to completion so the product is a mixture of monodi- and trisubstituted products, (b)...

Condensation of l,2-diazonaphthoquinone-4-sulfonyl chloride withp-ciimylpheno1. 

Materials DNQ was synthesized by esterification of o-cresol formaldehyde novolac resin (Mw=900) and of l,2-diazonaphthoquinone-5-sulfonyl chloride. The esterification rate was ca. 0.4. The novolac-based resist used in EB lithography to compare with SPP was... 

For resists designed for applications in the near-UV region, good absorption at 365 nm (i-line) and at 405 nm and 436 nra (g-line) is required, and aromatic substituents present the best option. The most commonly used ballast compound is polyhydroxybenzophenone, where one to three (or even four) hydroxyl groups can be esterified with diazoquinone sulfonyl-chloride, as discussed above. A popularly used dissolution inhibitor is a substituted 2,3,4-trihydroxy benzophenone of stmcture (in), " where DQ stands here for diazonaphthoquinone. One other popular diazoquinone derivative found in commercial resists is the sulfonyl ester of cumylphenol. Similar materials such as shown in structure (IV) have also been employed in resist applications. ... 

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