Structure and Physicochemical Properties of Polyalkylsiloxane Monolayers Prepared onto the Solid Substrate

Structure and Physicochemical Properties of Polyalkylsiloxane Monolayers Prepared onto the Solid Substrate 

Institute for Materials Chemistry and Engineering, Kyushu University, Higashi-ku, Fukuoka 812-8581, Japan 

Two methods have been proposed for the preparation of organosilane monolayers. One is chemisorption from organosilane solution [4-6], and the other one is Langmuir-Blodgett (LB) method or water-cast method [7-23], Fig. 1 shows the film formation mechanism of the organosilane by LB method (a) and chemisorption method (b). In the case of LB method (Fig. 1(a)), the toluene solution of organotrichlorosilane was spread on the water surface (pH 5.8) at a controlled subphase temperature. To attain quasi-equilibrium state of the monolayer, the monolayer was kept on the water subphase under a given 

Corresponding author. E-mail takahara cstf.kyushu-u.ac.jp 

Chemisorption from JB- solution or vapor phase onto Sl-wafer 

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