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Stress in anisotropic and patterned films

The chapter begins with an overview of elastic anisotropy in crystalline materials. Anisotropy of elastic properties in materials with cubic symmetry, as well as other classes of material symmetry, are described first. Also included here are tabulated values of typical elastic properties for a variety of useful crystals. Examples of stress measurements in anisotropic thin films of different crystallographic orientation and texture by recourse to x-ray diffraction measurements are then considered. Next, the evolution of internal stress as a consequence of epitaxial mismatch in thin films and periodic multilayers is discussed. Attention is then directed to deformation of anisotropic film-substrate systems where connections among film stress, mismatch strain and substrate curvature are presented. A Stoney-type formula is derived for an anisotropic thin film on an isotropic substrate. Anisotropic curvature due to mismatch strain induced by a piezoelectric film on a substrate is also analyzed. [Pg.167]

Focus is then shifted to the evolution of curvature in layered systems in response to the introduction of geometric nonuniformity. For this purpose, a detailed derivation is provided for the Stoney-type formula for films [Pg.167]


Stress in anisotropic and patterned films laser beam... [Pg.234]


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