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Standing-wave effect, reduction

Walker, Reduction of photoresist standing wave effects by post exposure bake, IEEE Trans. Electron Dev. ED-22(7), 464 466 (1975). [Pg.557]

The second part rab) stands for the vertical difference ds between the SWL and the middle of the berm and becomes 0 if the berm lies on the still water line. The reduction of wave run-up or wave overtopping is maximum for a berm on the still water line and decreases with increasing ds- Thus, a berm lying on the still water line is most effective. A berm lying below 2 Hmo or above i 2% has no influence on wave run-up and wave overtopping. [Pg.399]

See other pages where Standing-wave effect, reduction is mentioned: [Pg.348]    [Pg.94]    [Pg.411]    [Pg.134]    [Pg.320]    [Pg.486]    [Pg.1247]    [Pg.175]    [Pg.411]    [Pg.301]    [Pg.486]    [Pg.411]    [Pg.557]    [Pg.93]    [Pg.70]    [Pg.238]    [Pg.1200]    [Pg.214]    [Pg.218]   
See also in sourсe #XX -- [ Pg.94 ]



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