Silylated polyhydroxystyrene

A chemically amplified, positive-working resist system based on silylated polyhydroxystyrene has shown its capability for application to quarter micron lithography. The present paper describes the recent improvement in the resist performance achieved through studies on polymer characteristics and process conditions. Possible measures to suppress a peculiar problem of positive-working chemical amplification systems, i.e., formation of T-shaped profile, is also presented. Although the development is still on the way, the silylated polyhydroxystyrene based resist tem shows excellent properties on resolution capability, sensitivity and process latitude. 

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