Silicon crystal native defect

Perfection especially is required on the silicon surface. A 100 surface of silicon contains 6.8 x 1014 atoms/cm2. Surface defect densities must be less than one part in 105—105 defects/cm2 for satisfactory MOSFET operation. In fact, the discovery of the original point contact transistor was only possible because the native oxide on single-crystal germanium has surface defect densities less than one part in 104. Good silicon devices required the discovery (10) that the thermal oxidation of silicon could produce an excellent Si—Si02 interface. 

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