SfMA-HlOFlO

All homo- and copolymers were synthesized by radical polymerization at 80 C for 4 hours using AIBN (2-4 mol% with respect to the total monomer amount) as radical initiator. The solvent used depended on the monomer sfMA-HlFl and sfMA-H2F4 were polymerized in chloroform, while sfMA-HlOFlO and sfMA-H2F8 copolymerizations with MMA required BFMB as solvent. The polymerizations were carried out under stirring in a two-necked Schlenk flask adapted to a Schlenk line after three freeze-vacuum thaw cycles in nitrogen atmosphere. After polymerization, the reaction mixture was diluted with BFMB/CHCI3 and precipitated into the 10-fold excess of methanol, filtered off, washed, and dried in a vacuum oven at 50°C. 

Determination of molar masses and polydispersity of /polymers is often complicated because of the limited solubility particularly of highly fluorinated polymers. To avoid different conditions for the polymers and to ensure a certain comparison, SEC with a mixture of pentafluorophenol (PFP)/chloroform (1/3 vol/vol) as eluent (even if some of the samples were soluble in chloroform or tetrahydrofurane, THF), refractive index (RI) detection, and PMMA standards for calibration and determination of relative molar masses was employed. For some samples, molar masses could not be detected due to isorefractive behavior (no signal due to same RI of sample and eluent). This was observed in the series for P(MMA-co-sfMA-H10F10) at 20-25 mol% sfMA-HlOFlO and for P(MMA-co-sfMA-H2F8) at 20-30 mol% sfMA-H2F8. The chemical characterization of selected copolymers used for the present study is given in Table 11.2. 

FIGURE 11.19 Temperature-dependent SAXS curves (as contour plot) of two series of P(MMA-co-sfMA) copolymers (a) P(MMA-co-sfMA-HlOFlO) with 49 mol% sf, (b) P(MMA-co-s MA-H2F8) with 77 mol% sf. Intensity contour plot (in grayscale) log(l) versus T and vs. d, first run with heating/cooling rates of 3 K/min. 

FIGURE 11.20 XR-measurements on films of P(MMA-co-sfMA-HlOFlO) (a) with 54 mol% sf, fihn thickness 15 nm and (b) with 36 mol% sf, fihn thickness 87 nm, annealed at different temperatures. Reflectivity curves after off-line annealing and cooling. 

TABLE 11.7 Structure Parameters of T-GISAXS Experiments—Layer Distances (nm) in Eilms of P(MMA-cu-sfMA-HlOFlO) With 54 mol% sf, Film Thickness 15 nm and With 36 mol% sf. Film Thickness 87 nm... 

FIGURE 11.24 Ultrahydrophobicity a drop of water on an ullrahydrophobic P(MMA-co-sfMA-HlOFlO) surface (O. Fischer, IFF Dresden). 

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