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Semiconductor noncatalytic

Noncatalytic surfaces (e.g., nonconductors, noncatalytic metals, noncatalytic semiconductors) have to be activated (i.e., made catalytic) prior to electroless deposition. This activation is performed by generating catalytic nuclei on the surface of a noncatalytic material. Two major types of processes have been used to produce catalytic nuclei electrochemical and photochemical. [Pg.153]

This section provides brief descriptions of industrial processes in which noncatalytic gas-solid reactions play a major role. Although by no means complete, the discussion includes both traditional processes, such as the blast furnace for the production of iron from ore and the regeneration of fluidized-bed catalytic cracking catalyst, and newer processes such as the dry capture of SO2 from flue gas and the production of silicon for semiconductor applications. Each of the three primary reactor types is represented in the processes described. [Pg.1158]


See other pages where Semiconductor noncatalytic is mentioned: [Pg.1151]    [Pg.1160]    [Pg.297]    [Pg.307]    [Pg.134]   
See also in sourсe #XX -- [ Pg.153 , Pg.154 , Pg.155 , Pg.156 ]




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