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SAMs stability

The effect of nonpolar solvents on the electrochemical behavior of surface-confined redox groups has also been studied by Geiger et al. Undiluted monolayers containing polynorbornyl spacers between dimethoxynaphthalene redox probes and the electrode were employed (System 9). Thiol, dithiol or disulfide head groups were used to increase SAM stability in nonpolar solvents [103]. Calculated by Laviron s method, the values of ket are an order of magnitude faster than expected for a same-length alkanethiol spacer in an organic solvent [104]. The unexplained difference... [Pg.2935]

Rationale and Synthesis of Dithiol Tethers for Enhanced SAM Stability and Reduced Nonspecific Binding... [Pg.165]

Organosilanes, such as trichlorosilanes or trimethylsilanes, can establish SA monolayers on hydroxylated surfaces. Apart from their (covalent) binding to the surface these molecules can also establish a covalent intennolecular network, resulting in an enlranced mechanical stability of the films (figure C2.4.11). In 1980, work was published on the fonnation of SAMs of octadecyltrichlorosilane (OTS) 11171. Subsequently, the use of this material was extended to the fonnation of multilayers 11341. [Pg.2623]

Thermal stability. The tliennal stability of SAMs is, similarly to LB films, an important parameter for potential applications. It was found tliat SA films containing alkyl chains show some stability before an increase in tire number of gauche confonnations occurs, resulting in melting and irreversible changes in tire film. The disordering of tire... [Pg.2626]

SAMs tliat are made out of stmctures capable of fonning strong intennolecular hydrogen bonds have been studied especially in view of tlieir expected high thennal and chemical stability [186, 187],... [Pg.2627]

SAMs of alkanethiols on an Au(l 11) surface are widely used to control surface properties, electron transfer processes and to stabilize nano-clusters [6, 7]. SAMs are formed by chemical bond formation between Sand Au when an Au(l 11) substrate is immersed in a solution containing several mM of alkanethiols for hours to days. Various functions have been realized by using SAM s of alkanethiols on Au substrates as listed in Table 16.1. [Pg.279]

For transition and precious metals, thiols have been successfully employed as the stabilizing reagent (capping reagent) of metal nanoparticles [6]. In such cases, various functionalities can be added to the particles and the obtained nanoparticles may be very unique. It is well known that thiols provide good self-assembled monolayers (SAM) on various metal surfaces. When this SAM technique is applied to the nanoparticle preparation, nanoparticles can be covered constantly by functionalized moieties, which are connected to the terminal of thiol compounds. [Pg.453]

The number of samples of reference material needed is a commercial issue in the first place. An important variable is the number of samples likely to be sold during the lifetime ( shelf life ) of the reference material. As the lifetime is a function of the intrinsic stability of the material, this variable also affects the amount of raw material is needed. For instance, microbiological materials have limited intrinsic stability, and therefore their lifetime is expected to be shorter than for a dry sediment certified for trace elements. So, under the assumption of an equal number of sam-... [Pg.11]

Many commercial hplc instruments optionally provide a forced air oven which will control temperature with a stability of typically 0.1 °C from ambient temperature to 100 °C. Because of the use of flammable solvents, safety considerations are important, so the ovens are usually provided with a facility for nitrogen purging and are designed to prevent the build up of solvent vapour in the event of a leak. If temperature control is used, it is important that the sam-... [Pg.255]

In order to prevent the irrevisible adhesion of MEMS microstructures, several studies have been performed to alter the surface of MEMS, either chemically or physically. Chemical alterations have focused on the use of organosilane self-assembled monolayers (SAMs), which prevent the adsorption of ambient moisture and also reduce the inherent attractive forces between the microstructures. Although SAMs are very effective at reducing irreversible adhesion in MEMs, drawbacks include irreproducibility, excess solvent use, and thermal stability. More recent efforts have shifted towards physical alterations in order to increase the surface roughness of MEMS devices. [Pg.52]

Tyrl52 (145), mediates the formation of ACC from SAM via a catalytic mechanism involving a quinoid intermediate (according to Li et aC) and stabilizes the pyridine ring of PLP ... [Pg.100]

Similar to other fundamental studies on SAMs, alkane thiols on Au(l 11) have also been prevailing in electrochemistry with, however, aromatic thiols receiving increased attention. A major topic has been formation and stability of SAMs and... [Pg.209]

Metal UPD at the SAM/substrate interface is of interest for several reasons. Firstly, from an application point of view as the intercalation of another metal alters the thiol-substrate bond and, thus, the stability of a SAM that can be exploited to generate heterogeneous and patterned SAMs, a point we will return to later. Secondly, the intercalation and alteration of the thiol-substrate bond changes the morphology of a... [Pg.228]

Figure 5.15 Stability change of a SAM of propane thiol on Au/ mica by UPD of a series of metals. The linear sweep voltammograms were recorded in 0.5 M KOH at a scan rate ofO.l V/s. The electrode area was 0.36 cmf In the case of Cu UPD no desorption is discernible since the stability is increased to such an extent that the desorption peak shifts negative beyond the range shown into the region of hydrogen evolution. Reproduced with permission from Ref [202]. Figure 5.15 Stability change of a SAM of propane thiol on Au/ mica by UPD of a series of metals. The linear sweep voltammograms were recorded in 0.5 M KOH at a scan rate ofO.l V/s. The electrode area was 0.36 cmf In the case of Cu UPD no desorption is discernible since the stability is increased to such an extent that the desorption peak shifts negative beyond the range shown into the region of hydrogen evolution. Reproduced with permission from Ref [202].
It is obvious that the change in stability upon UPD of Cu and Ag (Figure 5.15) can be harnessed for manipulation of SAMs, as demonstrated by the scheme of Figure 5.20a where nanopores were created in a sequence of steps involving UPD of both Ag and Cu as well as reductive desorption and adsorption of thiols [219,220]. [Pg.235]


See other pages where SAMs stability is mentioned: [Pg.221]    [Pg.221]    [Pg.162]    [Pg.113]    [Pg.114]    [Pg.221]    [Pg.221]    [Pg.162]    [Pg.113]    [Pg.114]    [Pg.203]    [Pg.395]    [Pg.2625]    [Pg.121]    [Pg.323]    [Pg.445]    [Pg.443]    [Pg.455]    [Pg.653]    [Pg.489]    [Pg.170]    [Pg.144]    [Pg.33]    [Pg.782]    [Pg.65]    [Pg.498]    [Pg.393]    [Pg.249]    [Pg.255]    [Pg.77]    [Pg.32]    [Pg.201]    [Pg.211]    [Pg.211]    [Pg.212]    [Pg.213]    [Pg.216]    [Pg.228]    [Pg.229]    [Pg.235]    [Pg.244]   
See also in sourсe #XX -- [ Pg.209 , Pg.212 , Pg.221 , Pg.228 , Pg.235 ]

See also in sourсe #XX -- [ Pg.209 , Pg.212 , Pg.221 , Pg.228 , Pg.235 ]




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