Richardson-Schottky mechanism

To study charge injection mechanisms, we have tried to fit Richardson-Schottky thermionic emission and Fowler-Nordheim tunnelling mechanisms. We have found that under forward bias, the temperature-independent Fowler-Nordheim (FN) tunnelling mechanism is applicable, which presumes tunnelling of charge carriers directly into the bands of the semiconductor. According to the model, the current density J) is related to the applied field F) as [11,12] ... [Pg.198]

Under reverse bias, the FN tunnelling mechanism did not apply. On the other hand, the current-density was found to follow Richardson-Schottky thermionic emission model, where tunnelling through the barrier is ignored and field-induced barrier lowering is taken into consideration. The current density at a temperature T is given by [13] ... [Pg.200]