Resolution-line edge roughness-sensitivity trade-off

5 Resolution - line edge roughness - sensitivity trade-off 

Attempts have been made to model the relationship between these three eritieal performanee parameters resolution, LER, and sensitivity. Among these, the 

Levinson, EUV lithography s future, presented at EUVL Symp., Lake Tahoe, Sept. 30, 2008. van Steenwinekel, et al., A novel method for characterizing resist performance, Proc. SPIE 6519, 65190V (2007). 

Of all the three performance metrics discussed above, LER continues to be the most challenging metric to meet for the 22-nm nodes and beyond. 

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