PS-fo-PMMA

A combination of ATRP and ROP was employed for the synthesis of PLLA-fr-PS block copolymers and PLLA-fr-PS-fo-PMMA triblock terpoly-mers [120]. Styrene was initially polymerized using the functional initiator /3-hydroxyethyl a-bromobutyrate, HEBB, and the catalytic system CuBr/bpy. 

The Russell group has applied the template synthesis approach to nanoporous films generated from UV-treated PS-fo-PMMA copolymers [43, 147,233,235,241], which were pre-aligned perpendicular to the substrate by an electric field. Through direct current electrodeposition, they fabricated high-density vertical arrays of ferromagnetic cobalt nanowires (Fig. 10a) [43]. Through subsequent work, they also demonstrated the successful replication... 

Nealey and coworkers [75,76,146] took a similar approach and apphed lithographically defined self-assembled monolayers as substrates to direct the orientation of block copolymer thin films. After EUV interferometic lithography on octadecyltrichlorosilane (OTS) or phenylethyltrichlorosilane (PETS) monolayers, PS-fo-PMMA block copolymers were deposited and annealed on the substrates. Due to the selective wetting of PS and PMMA on the unexposed and exposed regions, respectively, they were able to obtain large areas of perpendicular lamella when the commensurate condition was fulfilled. 

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