Primary ion implantation

As no Cesium is present in the substrate before analysis, the enhancement or suppression effect continues to increase with increasing sputtering time until steady-slate sputtering is reached. Steady state refers to the condition where the primary ion implantation rate equates to the sputtering rate of implant primary ions. 

Quantification is further complicated by the fact that a vast array of analytical conditions can be used in SIMS. This is realized as these can influence the surface chemistry (primary ion implantation, damage, and segregation) and thus introduce... 

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