Potential growth spot

Entity Xi is the potential growth spot that is used as the groundwork to attach the second entity, which is the precursor X (step [14.R6a]). Molecules of precmsorX successively attach to each other to iiKiease the dimensions of the growing spot (steps [14.R6b] to [14.R6n ]) until the production of B, when the spot enters the growth stage after reaching size n. ... 

The process of pitting may be divided into initiation and growth. Initiation of pitting may be caused by setting up of local cathodes due to impurities as described above. This causes the local cell potential to rise above the pitting potential. Thus, local weak spots in the oxide film break down and a local anodic area develops. Oxide films may be weakened by the... 

The position and distance of the two spots are variable. This approach has merit for the following reasons One can see whether the process of interest is of mean-field type or nucleation-growth. In the former case, the reflection signals at the two spots as the response to a single potential step should be a identical function of time. Additionally, one can see the two-dimensional uniformity of the kinetics or one can estimate the rate of the surface diffusion process. 

Figure 2 Schematic illustration of structure generation by sequential growth. In (A) an initial fragment is placed in a receptor site near a hot spot identified as a potential interaction point in (B) and (C) additional fragments are added to the growing structure.

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