Positive-acting resists advantages

The microdomain template as shown above (Figure 2) is not an effective mask for RIE because the PS, PI, and PB blocks etch approximately at the same rate under either CF4 or CF4/O2 RIE, which we find to be the most effective etching process for pattern transfer. Therefore, further modification of the microdomains is necessary to make a useful mask. By allowing the monolayer to act as a template and taking advantage of the different chemical properties of the component blocks, we found that the template could function as either a positive or negative resist for pattern transfer. 

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