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Polysiloxanes with acid-sensitive groups

The present invention relates to an alignment layer, and more particularly to an alignment layer with photo-sensitive material selected from the group consisting of a pyranose polymer, a furanose polymer, polyvinyl cinnamate, polysiloxane cinnamate, polyvinyl alcohol, polyamide, polyimide, polyamic acid and silicone dioxide. [Pg.212]

See other pages where Polysiloxanes with acid-sensitive groups is mentioned: [Pg.81]    [Pg.150]    [Pg.373]    [Pg.343]    [Pg.216]    [Pg.235]    [Pg.242]    [Pg.7594]    [Pg.591]    [Pg.373]    [Pg.62]    [Pg.683]    [Pg.62]    [Pg.7594]   
See also in sourсe #XX -- [ Pg.83 ]



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