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Polymers for Chemical Amplification

Phenyl groups show a weak absorption at 280 nm and strong absorption at 200 nm. Therefore, most PAGs show a moderate absorption at 248 nm and a strong absorption at 248 nm. Ohwa reported absorption spectra of various PAGs. Absorption coefficients of PAG estimated from their spectra are shown in Table 2.1. Triphenylsulfonium trifluoromethane [Pg.65]

Phenyls strongly absorb UV light less than 200 nm because of aromatics. Then alkanes are applied to main chain polymers for ArF lithography (198 nm). Phenyls are superior in dry etching. It is necessary to improve characteristics of dry etching for polymers not containing phenols. The Ohnishi parameter is helpful to indicate characteristics of dry etching it is shown in Equation (2.1). [Pg.66]

The Ohnishi parameter is proportional to the velocity of dry etching. The polymer of a smaller value of the Ohnishi parameter is proper for a CA resist. Ohnishi parameters of typical organic materials are shown in Tables 2.2 and 2.3. [Pg.66]

The Ohnishi parameter of cyclohexane is 3.0, while that of anthracene is 1.7. The greater the number of aromatic rings, the smaller the parameter, and the greater the number of rings in alkane, fhe smaller the parameter. [Pg.67]

Poly(TCDA-RMA-MAA). TCDA = tricyclodecylacrylate, RMA = alkylmethacrylate, MAA methacrylic acid. [Pg.68]


Aoai, Y. Aotani, A. Umehara, and T. Kokubo, Apphcation of silylether and silylester polymer for chemical amplification system, J. Photopolym. Sci. Technol 3, 389 (1990) M. Tsunooka, H. Yanai, M. Kitayama, and M. Shiraj, Photo initiated acid formation and its applications the acid formation mechanism in photolysis of p ketosulfones inpolymer matrices, J. Photopolym. Sci. Technol. 4, 239 (1991). [Pg.341]

Inaki, Y, Acid sensitive pyrimidine polymers for chemical amplification resist, Polym. Mater. Sci Eng., 66, 109, 1992. [Pg.2150]

Inaki, Y, Matsumura, N., and Takemoto, K Acid sensitive pyrimidine polymers for chemical amplification resists, Polymers for Microelectronics, Thompson, L.R, Willson, G., and Tagawa, S., Eds, ACS Symp. Sen, 537,142,1994. [Pg.2151]


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