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Acid-sensitive pyrimidine polymers

Inaki, Y, Acid sensitive pyrimidine polymers for chemical amplification resist, Polym. Mater. Sci Eng., 66, 109, 1992. [Pg.2150]

Inaki, Y, Matsumura, N., and Takemoto, K Acid sensitive pyrimidine polymers for chemical amplification resists, Polymers for Microelectronics, Thompson, L.R, Willson, G., and Tagawa, S., Eds, ACS Symp. Sen, 537,142,1994. [Pg.2151]

Horito, H., Inaki, Y, and Takemoto, K., Photochemistry and acid sensitivity of pyrimidine polymers, /. Photopolym. Sci Technol, 4, 33,1991. [Pg.2150]

This paper deals with the application of the tautomerism of uracO to a chemical amplification photoresist. Pofyethers containing 2,4-dialkoi pyrimidine units (3) were prepared. These polymers were found to be very sensitive to an acid and to be applicable to diemical amplification photoresists (Scheme 3). [Pg.144]

See other pages where Acid-sensitive pyrimidine polymers is mentioned: [Pg.143]    [Pg.147]    [Pg.149]    [Pg.151]    [Pg.157]    [Pg.163]    [Pg.143]    [Pg.147]    [Pg.149]    [Pg.151]    [Pg.157]    [Pg.163]    [Pg.17]    [Pg.367]    [Pg.236]    [Pg.128]    [Pg.367]    [Pg.972]    [Pg.195]    [Pg.17]    [Pg.127]   


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