Polyferrocenylsilanes block copolymers

Polyferrocenylsilane Block Copolymers Nanotubes and Nanowires through Self-Assembly... 

Polyferrocenylsilane block copolymers also phase separate in solid state to generate periodic, nanoscopic iron-rich domains that can be observed by TEM without resorting to staining techniques.24 This bulk self-assembly behavior has been studied with various block copolymers, such as PS-fe-PFS,24,52 PI-h-PFS,49 and PFS-b-PMMA.22 Additional self-assembly complications... 

Based on the studies of organic block copolymers (see Chapter 1, Section 1.2.5), polyferrocenylsilane block copolymers can be expected to self-assemble in solvents which are selective for one of the blocks. In the case of organic block copolymers, most studies have led to the identification of spherical structures, where the less... 

Polyferrocenylsilane block copolymers in which the blocks are immiscible (which is generally the case) would be expected to self-assemble to form phase-separated organometallic domains in the solid state. Based on the classical behavior of organic block copolymers, thin films of polyferrocene diblock copolymers would be expected to form domains such as spheres, cylinders, double diamonds (or gyro-ids) (or their antistructures), or lamellae (Chapter 1, Section 1.2.5). The preferred domain structure would be expected to be controlled by the ratio of the blocks, their degree of immiscibility (as defined by the Flory-Hu ins interaction parameter x), and the overall molecular weight of the block copolymer [159]. 

The first studies of polyferrocenylsilane block copolymer films were reported in 1996 and utilized DSC and TEM to analyze the phase separation in the materials (83j. In the case of PS-b-PFS (3.54) and PFS-b-PDMS (3.52), it was demonstrated that the electron-rich Fe atoms of the polyferrocenylsilane block cause sufficient electron scattering to provide contrast with the organic or inorganic coblocks, so that selective staining of one of the blocks, which is generally required for all-or-... 

Cao L, Massey JA, Winnik MA, Manners I, Riethmuller S, Banhart F, Spatz JP, Mdller M (2003) Reactive ion etching of cylindrical polyferrocenylsilane block copolymer micelles fabrication of ceramic nanolines on semiconducting substrates. Adv Fund Mater 13 271-276... 

Self-Assembly and Applications of Polyferrocenylsilane Block Copolymers... 

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