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Poly , behavior during characterization

Liu et al. [LIU 11] have revised the NPDD model to characterize the behavior of the PQ/PMMA photopolymer material. Based on a detailed analysis of the photochemical mechanisms present in phenanthrenequinone (7 2)/poly(methyl methacrylate) (PMMA) photopolymer during holographic grating formation, a set of rate equations have been derived, which govern... [Pg.258]

See other pages where Poly , behavior during characterization is mentioned: [Pg.70]    [Pg.447]    [Pg.276]    [Pg.23]    [Pg.517]    [Pg.133]    [Pg.138]    [Pg.268]    [Pg.23]    [Pg.1278]    [Pg.114]    [Pg.30]    [Pg.480]    [Pg.530]    [Pg.35]    [Pg.428]    [Pg.424]    [Pg.212]    [Pg.428]    [Pg.36]    [Pg.495]    [Pg.175]    [Pg.367]    [Pg.180]    [Pg.290]    [Pg.239]    [Pg.110]    [Pg.342]    [Pg.292]    [Pg.181]    [Pg.166]    [Pg.274]    [Pg.175]    [Pg.40]    [Pg.245]    [Pg.776]   
See also in sourсe #XX -- [ Pg.403 ]



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Poly behavior

Poly characterization

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