Plasma etching loading effects

A characteristic of the plasma etching process which is generally observed is that the etch rate of a sample decreases as the area of the sample exposed to the plasma increases This dependence of etch rate on batch size is referred to as the loading effect and an example is shown in Fig. 3.8. The reason for the loading effect is simply that the etching process consumes a significant fraction of the... 

Mogab CJ (1977) The loading effect in plasma etching. J Electrochem Soc 124 1262... 

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